000 01451nam a2200313 a 4500
001 ebr10055392
003 CaPaEBR
007 cr cn|||||||||
008 911004s1991 dcua s 000 0 eng
010 _z 91066812
020 _z0309045975
040 _aCaPaEBR
_cCaPaEBR
035 _a(OCoLC)43475627
050 1 4 _aTA2005
_b.N37 1991eb
082 0 4 _a621.044
_220
110 2 _aNational Research Council (U.S.).
_bPanel on Plasma Processing of Materials.
245 1 0 _aPlasma processing of materials
_h[electronic resource] :
_bscientific opportunities and technological challenges /
_cPanel on Plasma Processing of Materials, Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council.
260 _aWashington, D.C. :
_bNational Academy Press,
_c1991.
300 _axii, 75 p. :
_bill.
533 _aElectronic reproduction.
_bPalo Alto, Calif. :
_cebrary,
_d2013.
_nAvailable via World Wide Web.
_nAccess may be limited to ebrary affiliated libraries.
650 0 _aPlasma engineering.
650 0 _aMicroelectronics
_xMaterials
_xEffect of radiation on.
650 0 _aSurfaces (Technology)
655 7 _aElectronic books.
_2local
710 2 _aebrary, Inc.
856 4 0 _uhttp://site.ebrary.com/lib/kliuc/Doc?id=10055392
_zAn electronic book accessible through the World Wide Web; click to view
942 _2lcc
_cEBK
999 _c151496
_d151496