000 02001nam a2200445 i 4500
001 ebr10881255
003 CaPaEBR
007 cr cn|||||||||
008 140620t20142014gw a ob 001 0 eng d
020 _z9783527411528
020 _a9783527681082 (e-book)
020 _z9783527681105 (ePub)
020 _z9783527681099 (Mobi)
020 _z9783527681075 (oBook)
040 _aCaPaEBR
_beng
_erda
_epn
_cCaPaEBR
035 _a(OCoLC)881028799
050 1 4 _aQC415
_b.S478 2014eb
082 0 4 _a621.36
_223
100 1 _aServ�in, Manuel,
_eauthor.
245 1 0 _aFringe pattern analysis for optical metrology :
_btheory, algorithms, and applications /
_cManuel Servin, J. Antonio Quiroga, and J. Moises Padilla.
264 1 _aWeinheim, Germany :
_bWiley-VCH Verlag GmbH & Co. KGaA,
_c2014.
264 4 _c�2014
300 _a1 online resource (345 pages) :
_billustrations
336 _atext
_2rdacontent
337 _acomputer
_2rdamedia
338 _aonline resource
_2rdacarrier
504 _aIncludes bibliographical references and index.
588 _aDescription based on online resource; title from PDF title page (ebrary, viewed June 19, 2014).
590 _aElectronic reproduction. Palo Alto, Calif. : ebrary, 2015. Available via World Wide Web. Access may be limited to ebrary affiliated libraries.
650 0 _aDiffraction patterns
_xData processing.
650 0 _aImage processing
_xData processing.
655 0 _aElectronic books.
700 1 _aQuiroga, J. Antonio,
_eauthor.
700 1 _aPadilla, J. Moises,
_eauthor.
776 0 8 _iPrint version:
_aServin, Manuel.
_tFringe pattern analysis for optical metrology : theory, algorithms, and applications.
_dWeinheim, Germany : Wiley-VCH Verlag GmbH & Co. KGaA, c2014
_hxvi, 327 pages
_z9783527411528
797 2 _aebrary.
856 4 0 _uhttp://site.ebrary.com/lib/kliuc/Doc?id=10881255
_zAn electronic book accessible through the World Wide Web; click to view
942 _2lcc
_cEBK
999 _c232829
_d232829